Phys. Rev. E 66, 051905 (2002) [4 pages]Temperature dependence of formation of a supported phospholipid bilayer from vesicles on SiO2Received 9 April 2002; published 13 November 2002 Adsorption of egg-phosphatidylcholine vesicles and bilayer formation on a SiO2 surface was investigated in the temperature range 278–303 K using the quartz crystal microbalance-dissipation technique. The critical coverage for the vesicle→bilayer transition is found to decrease with increasing temperature. The temperature dependence of the time-scale characterizing this transition can be represented in the Arrhenius form. Higher temperatures produce a bilayer with fewer trapped, nonruptured vesicles. © 2002 The American Physical Society URL:
http://link.aps.org/doi/10.1103/PhysRevE.66.051905
DOI:
10.1103/PhysRevE.66.051905
PACS:
87.16.Dg, 87.68.+z, 87.14.Cc, 87.15.Rn
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