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Phys. Rev. E 57, 5945–5951 (1998)

Electrical conductivity of dense copper and aluminum plasmas

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A. W. DeSilva and J. D. Katsouros
Laboratory for Plasma Research and Department of Physics, University of Maryland at College Park, College Park, Maryland 20742

See Also: Erratum

Received 10 November 1997; published in the issue dated May 1998

Measurements are reported of the electrical conductivity of dense copper and aluminum plasmas in the temperature range 10–30 kK, in a density range from about one-fifth solid density down to 0.02g/cm3. Plasmas were created by rapid vaporization of metal wires in a water bath. At temperatures below about 15 kK, as density decreases from the highest values measured, the conductivity falls roughly as the cube of density, reaches a minimum, and subsequently rises to approach the Spitzer prediction at low density. This minimum is not seen for temperatures above about 20 kK. These results are compared with several theoretical predictions.

© 1998 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevE.57.5945
DOI:
10.1103/PhysRevE.57.5945
PACS:
52.25.Fi, 52.80.Mg, 52.80.Qj

See Also

Erratum: A. W. DeSilva and J. D. Katsouros, Erratum: Electrical conductivity of dense copper and aluminum plasmas [Phys. Rev. E 57, 5945 (1998)], Phys. Rev. E 59, 3774 (1999).